cat_2

CATEGORY 2—MATERIALS PROCESSING

2A Systems, Equipment and Components

(For quiet running bearings, see the Munitions List)

2A001 Anti-friction bearings and bearing systems, as follows, and components for such bearings and systems: (L.N. 42 of 2017)

N.B.:

See also 2B350(i).

(a) Capable of an inlet volume flow rate of 50 m³/h or greater;

(b) Capable of a pressure ratio of 2:1 or greater;

(1) Aluminium or aluminium alloy;

(2) Aluminium oxide;

(3) Stainless steel;

(4) Nickel or nickel alloy;

(5) Phosphor bronze;

(6) Fluoropolymers;

(L.N. 42 of 2017)

2B350 Chemical manufacturing facilities, equipment and components, as follows: (L.N. 65 of 2004)

(a) Reaction vessels or reactors, with or without agitators, with total internal (geometric) volume greater than 0.1 m³ (100 litres) and less than 20 m³ (20 000 litres), where all surfaces that come in direct contact with the chemical(s) being processed or contained are made from any of the following materials:

N.B.:

For prefabricated repair assemblies, see 2B350(k). (L.N. 89 of 2021)

(1) ‘Alloys’ with more than 25% nickel and 20% chromium by weight;

(2) Fluoropolymers (polymeric or elastomeric materials with more than 35% fluorine by weight);

(3) Glass (including vitrified or enamelled coating or glass lining);

(4) Nickel or ‘alloys’ with more than 40% nickel by weight;

(5) Tantalum or tantalum ‘alloys’;

(6) Titanium or titanium ‘alloys’;

(7) Zirconium or zirconium ‘alloys’;

(8) Niobium (columbium) or niobium ‘alloys’; (L.N. 254 of 2008)

(b) Agitators designed for use in reaction vessels or reactors specified in 2B350(a); and impellers, blades or shafts designed for such agitators, where all surfaces of the agitator that come in direct contact with the chemical(s) being processed or contained are made from any of the following materials: (L.N. 65 of 2004; L.N. 95 of 2006; L.N. 42 of 2017)

(1) ‘Alloys’ with more than 25% nickel and 20% chromium by weight;

(2) Fluoropolymers (polymeric or elastomeric materials with more than 35% fluorine by weight);

(3) Glass (including vitrified or enamelled coatings or glass lining);

(4) Nickel or ‘alloys’ with more than 40% nickel by weight;

(5) Tantalum or tantalum ‘alloys’;

(6) Titanium or titanium ‘alloys’;

(7) Zirconium or zirconium ‘alloys’;

(8) Niobium (columbium) or niobium ‘alloys’; (L.N. 254 of 2008)

(c) Storage tanks, containers or receivers with a total internal (geometric) volume greater than 0.1 m³ (100 litres) where all surfaces that come in direct contact with the chemical(s) being processed or contained are made from any of the following materials:

N.B.:

For prefabricated repair assemblies, see 2B350(k). (L.N. 89 of 2021)

(1) ‘Alloys’ with more than 25% nickel and 20% chromium by weight;

(2) Fluoropolymers (polymeric or elastomeric materials with more than 35% fluorine by weight);

(3) Glass (including vitrified or enamelled coatings or glass lining);

(4) Nickel or ‘alloys’ with more than 40% nickel by weight;

(5) Tantalum or tantalum ‘alloys’;

(6) Titanium or titanium ‘alloys’;

(7) Zirconium or zirconium ‘alloys’;

(8) Niobium (columbium) or niobium ‘alloys’; (L.N. 254 of 2008)

(d) Heat exchangers or condensers with a heat transfer surface area greater than 0.15 m², and less than 20 m²; and tubes, plates, coils or blocks (cores) designed for such heat exchangers or condensers, where all surfaces that come in direct contact with the chemical(s) being processed are made from any of the following materials: (L.N. 65 of 2004)

(1) ‘Alloys’ with more than 25% nickel and 20% chromium by weight;

(2) Fluoropolymers (polymeric or elastomeric materials with more than 35% fluorine by weight);

(3) Glass (including vitrified or enamelled coatings or glass lining);

(4) Graphite or ‘carbon graphite’; (L.N. 65 of 2004)

(5) Nickel or ‘alloys’ with more than 40% nickel by weight;

(6) Tantalum or tantalum ‘alloys’;

(7) Titanium or titanium ‘alloys’; (L.N. 132 of 2001)

(8) Zirconium or zirconium ‘alloys’;

(9) Silicon carbide; (L.N. 132 of 2001)

(10) Titanium carbide; (L.N. 132 of 2001)

(11) Niobium (columbium) or niobium ‘alloys’; (L.N. 254 of 2008)

(e) Distillation or absorption columns of internal diameter greater than 0.1 m; and liquid distributers, vapour distributers or liquid collectors designed for such distillation or absorption columns, where all surfaces that come in direct contact with the chemical(s) being processed are made from any of the following materials: (L.N. 65 of 2004)

(1) ‘Alloys’ with more than 25% nickel and 20% chromium by weight;

(2) Fluoropolymers (polymeric or elastomeric materials with more than 35% fluorine by weight);

(3) Glass (including vitrified or enamelled coatings or glass lining);

(4) Graphite or ‘carbon graphite’; (L.N. 65 of 2004)

(5) Nickel or ‘alloys’ with more than 40% nickel by weight;

(6) Tantalum or tantalum ‘alloys’;

(7) Titanium or titanium ‘alloys’;

(8) Zirconium or zirconium ‘alloys’;

(9) Niobium (columbium) or niobium ‘alloys’; (L.N. 254 of 2008)

(f) Remotely operated filling equipment in which all surfaces that come in direct contact with the chemical(s) being processed are made from any of the following materials:

(1) ‘Alloys’ with more than 25% nickel and 20% chromium by weight; or

(2) Nickel or ‘alloys’ with more than 40% nickel by weight;

(g) Valves and components, as follows:

(1) Valves that meet all of the following descriptions:

(a) A ‘nominal size’ greater than DN 10 or NPS 3/8; (L.N. 85 of 2023)

(b) All surfaces that come in direct contact with the chemical(s) being produced, processed, or contained are made from ‘corrosion resistant materials’;

(2) Valves, other than those specified in 2B350(g)(1), that meet all of the following descriptions:

(a) A ‘nominal size’ equal to or greater than DN 25 or NPS 1 and equal to or less than DN 100 or NPS 4; (L.N. 85 of 2023)

(b) Casings (valve bodies) or preformed casing liners;

(d) All surfaces of the casing (valve body) or preformed case liner that come in direct contact with the chemical(s) being produced, processed, or contained are made from ‘corrosion resistant materials’; (L.N. 85 of 2023)

(3) Components, designed for valves specified in 2B350(g)(1) or 2B350(g)(2), in which all surfaces that come in direct contact with the chemical(s) being produced, processed, or contained are made from ‘corrosion resistant materials’, as follows:

(a) Casings (valve bodies);

(b) Preformed casing liners;

Technical Notes:

1. For the purposes of 2B350(g), ‘corrosion resistant materials’ mean any of the following materials:

(a) Nickel or ‘alloys’ with more than 40% nickel by weight;

(b) ‘Alloys’ with more than 25% nickel and 20% chromium by weight;

(d) Glass or glass-lined (including vitrified or enamelled coating);

(e) Tantalum or tantalum alloys; (L.N. 85 of 2023)

(f) Titanium or titanium alloys; (L.N. 85 of 2023)

(g) Zirconium or zirconium alloys; (L.N. 85 of 2023)

(h) Niobium (columbium) or niobium alloys; (L.N. 85 of 2023)

(i) Ceramic materials as follows:

(1) Silicon carbide with a purity of 80% or more by weight;

(2) Aluminium oxide (alumina) with a purity of 99.9% or more by weight;

(3) Zirconium oxide (zirconia).

2. ‘Nominal size’ is defined as the smaller of the inlet and outlet diameters. (L.N. 42 of 2017)

3. Nominal sizes (DN) of valves are in accordance with ISO 6708:1995. Nominal Pipe Sizes (NPS) are in accordance with ASME B36.10 or B36.19 or national equivalents. (L.N. 85 of 2023)

(h) Multi-walled piping incorporating a leak detection port, in which all surfaces that come in direct contact with the chemical(s) being processed or contained are made from any of the following materials:

(1) ‘Alloys’ with more than 25% nickel and 20% chromium by weight;

(2) Fluoropolymers (polymeric or elastomeric materials with more than 35% fluorine by weight);

(3) Glass (including vitrified or enamelled coatings or glass lining);

(4) Graphite or ‘carbon graphite’; (L.N. 65 of 2004)

(5) Nickel or ‘alloys’ with more than 40% nickel by weight;

(6) Tantalum or tantalum ‘alloys’;

(7) Titanium or titanium ‘alloys’;

(8) Zirconium or zirconium ‘alloys’;

(9) Niobium (columbium) or niobium ‘alloys’; (L.N. 254 of 2008)

(i) Multiple-seal and seal-less pumps, with manufacturer’s specified maximum flow-rate greater than 0.6 m³/hour, or vacuum pumps with manufacturer’s specified maximum flow-rate greater than 5 m³/hour (under standard temperature (273 K (0°C)) and pressure (101.3 kPa) conditions, other than those specified in 2B233); and casings (pump bodies), preformed casing liners, impellers, rotors or jet pump nozzles designed for such pumps, in which all surfaces that come in direct contact with the chemical(s) being processed are made from any of the following materials: (L.N. 65 of 2004; L.N. 95 of 2006; L.N. 42 of 2017)

(1) ‘Alloys’ with more than 25% nickel and 20% chromium by weight;

(2) Ceramics;

(3) Ferrosilicon (high silicon iron alloys); (L.N. 85 of 2023)

(4) Fluoropolymers (polymeric or elastomeric materials with more than 35% fluorine by weight);

(5) Glass (including vitrified or enamelled coatings or glass lining);

(6) Graphite or ‘carbon graphite’; (L.N. 65 of 2004)

(7) Nickel or ‘alloys’ with more than 40% nickel by weight;

(8) Tantalum or tantalum ‘alloys’;

(9) Titanium or titanium ‘alloys’;

(10) Zirconium or zirconium ‘alloys’;

(11) Niobium (columbium) or niobium ‘alloys’; (L.N. 254 of 2008)

Technical Note:

In 2B350(i), the term seal refers to only those seals that come into direct contact with the chemical(s) being processed (or is designed to), and provide a sealing function where a rotary or reciprocating drive shaft passes through a pump body. (L.N. 42 of 2017)

(j) Incinerators designed to destroy chemicals controlled by 1C350, having specially designed waste supply systems, special handling facilities and an average combustion chamber temperature greater than 1 273 K (1 000°C), in which all surfaces in the waste supply system that come into direct contact with the waste products are made from or lined with any of the following materials:

(1) ‘Alloys’ with more than 25% nickel and 20% chromium by weight;

(2) Ceramics; or

(3) Nickel or ‘alloys’ with more than 40% nickel by weight;

(k) Prefabricated repair assemblies having metallic surfaces that come in direct contact with the chemical(s) being processed that are made from tantalum or tantalum alloys as follows, and specially designed components for such prefabricated repair assemblies:

(1) Designed for mechanical attachment to glass-lined reaction vessels or reactors specified in 2B350(a); or

(2) Designed for mechanical attachment to glass-lined storage tanks, containers or receivers specified in 2B350(c); (L.N. 89 of 2021)

Note:

For the purposes of 2B350, the materials used for gaskets, packing, seals, screws, washers or other materials performing a sealing function do not determine the status of control, provided that such components are designed to be interchangeable. (L.N. 42 of 2017)

Technical Notes:

1. ‘Carbon graphite’ is a composition consisting of amorphous carbon and graphite, in which the graphite content is eight percent or more by weight.

2. For the listed materials in the above entries, the term ‘alloy’ when not accompanied by a specific elemental concentration is understood as identifying those alloys where the identified metal is present in a higher percentage by weight than any other element. (L.N. 161 of 2011)

(L.N. 254 of 2008; L.N. 161 of 2011; L.N. 42 of 2017)

2B351 Toxic gas monitors and monitoring systems and their dedicated detecting components, other than those specified in 1A004, as follows; and detectors, sensor devices and replaceable sensor cartridges for the monitors, systems and components: (L.N. 161 of 2011; L.N. 89 of 2021; L.N. 85 of 2023)

(a) Designed for continuous operation and usable for the detection of chemical warfare agents or chemicals controlled by 1C350, at concentrations of less than 0.3 mg/m³; or (L.N. 65 of 2004; L.N. 95 of 2006)

(b) Designed for the detection of cholinesterase-inhibiting activity;

2B352 Biological manufacturing and handling equipment, as follows: (L.N. 89 of 2021)

(a) Containment facilities and related equipment as follows:

(1) Complete containment facilities that meet the criteria for P3 or P4 (BL3, BL4, L3, L4) containment as specified in the WHO Laboratory Biosafety Manual (3rd edition, Geneva, 2004);

(2) Equipment designed for fixed installation in containment facilities specified in 2B352(a), as follows:

(a) Double-door pass-through decontamination autoclaves;

(b) Breathing air suit decontamination showers;

(b) Fermenters and components as follows:

(1) Fermenters capable of cultivation of “microorganisms” or of live cells for the production of viruses or toxins, without the propagation of aerosols, and having a total internal volume of 20 litres or more; (L.N. 89 of 2021; L.N. 85 of 2023)

(2) Components designed for fermenters specified in 2B352(b)(1) as follows: (L.N. 85 of 2023)

(a) Cultivation chambers designed to be sterilized or disinfected in situ;

(b) Cultivation chamber holding devices;

(c) Process control units capable of simultaneously monitoring and controlling 2 or more fermentation system parameters (e.g. temperature, pH, nutrients, agitation, dissolved oxygen, air flow, foam control); (L.N. 42 of 2017)

Technical Notes:

1. For the purposes of 2B352(b), fermenters include bioreactors, single-use (disposable) bioreactors, chemostats and continuous-flow systems.

2. Cultivation chamber holding devices include single-use cultivation chambers with rigid walls. (L.N. 85 of 2023)

(c) Centrifugal separators, capable of continuous separation without the propagation of aerosols, having all of the following characteristics: (L.N. 85 of 2023)

(1) Flow rate exceeding 100 litres per hour;

(2) Components of polished stainless steel or titanium;

(3) One or more sealing joints within the steam containment area; and

(4) Capable of in situ steam sterilization in a closed state; (E.R. 6 of 2020)

Technical Note:

Centrifugal separators include decanters.

(d) Cross (tangential) flow filtration equipment and component as follows:

(1) Cross (tangential) flow filtration equipment capable of separation of “microorganisms”, viruses, “toxins” or cell cultures, that meets all of the following descriptions: (L.N. 42 of 2017; L.N. 89 of 2021)

(a) A total filtration area equal to or greater than 1 m²; (L.N. 42 of 2017)

(b) Meeting any of the following descriptions:

(1) Capable of being ‘sterilized’ or ‘disinfected’ in situ;

(2) Using disposable or single-use filtration components; (L.N. 42 of 2017)

Technical Note:

In 2B352(d)(1)(b), ‘sterilized’ denotes the elimination of all viable microbes from the equipment through the use of either physical (e.g. steam) or chemical agents. ‘Disinfected’ denotes the destruction of potential microbial infectivity in the equipment through the use of chemical agents with a germicidal effect. Disinfection and sterilization are distinct from sanitization, the latter referring to cleaning procedures designed to lower the microbial content of equipment without necessarily achieving elimination of all microbial infectivity or viability. (L.N. 42 of 2017)

(2) Cross (tangential) flow filtration components (e.g. modules, elements, cassettes, cartridges, units or plates) with filtration area equal to or greater than 0.2 m² for each component and designed for use in cross (tangential) flow filtration equipment controlled by 2B352(d);

Note:

2B352(d) does not control reverse osmosis and hemodialysis equipment, as specified by the manufacturer. (L.N. 95 of 2006; L.N. 89 of 2021)

(e) Steam, gas or vapour sterilizable freeze drying equipment with a condenser capacity of 10 kg of ice or more in 24 hours and less than 1 000 kg of ice in 24 hours; (L.N. 89 of 2021)

(f) Protective and containment equipment, as follows:

(1) Protective full or half suits, or hoods dependent upon a tethered external air supply and operating under positive pressure;

Note:

2B352(f)(1) does not control suits designed to be worn with self-contained breathing apparatus.

(2) Biocontainment chambers, isolators, or biological safety cabinets having all of the following characteristics, for normal operation:

(a) Fully enclosed workspace where the operator is separated from the work by a physical barrier;

(b) Able to operate at negative pressure;

(d) Supply and exhaust air to and from the workspace is HEPA filtered;

Notes:

1. 2B352(f)(2) includes Class III biosafety cabinets, as described in the latest edition of the WHO Laboratory Biosafety Manual or constructed in accordance with national standards, regulations or guidance.

2. 2B352(f)(2) does not include isolators specially designed for barrier nursing or transportation of infected patients. (L.N. 89 of 2021)

3. 2B352(f)(2) includes any isolator meeting all the characteristics mentioned in 2B352(f)(2)(a) to (d), regardless of its intended use and its designation. (L.N. 85 of 2023)

(g) Aerosol inhalation equipment designed for aerosol challenge testing with “microorganisms”, viruses or “toxins” as follows:

(1) Whole-body exposure chambers having a capacity of 1 m³ or more;

(2) Nose-only exposure apparatus utilizing directed aerosol flow and having capacity for exposure of any of the following:

(a) 12 or more rodents;

(b) 2 or more animals other than rodents;

(3) Closed animal restraint tubes designed for use with nose-only exposure apparatus utilizing directed aerosol flow; (L.N. 89 of 2021)

(h) Spray-drying equipment capable of drying toxins or pathogenic “microorganisms”, that meets all of the following descriptions: (L.N. 85 of 2023)

(1) Having a water evaporation capacity of ≥ 0.4 kg/h and ≤ 400 kg/h;

(2) Having the ability to generate a typical mean product particle size of ≤ 10 μm with existing fittings or by minimal modification of the spray-dryer with atomization nozzles enabling generation of the required particle size;

(3) Capable of being sterilized or disinfected in situ; (L.N. 42 of 2017; L.N. 85 of 2023)

(i) Nucleic acid assemblers and synthesisers, which are partly or entirely automated, and designed to generate continuous nucleic acids greater than 1.5 kilobases in length with error rates less than 5% in a single run; (L.N. 89 of 2021)

(L.N. 65 of 2004)

2C Materials

None.

2D Software

2D001 “Software”, other than that specified in 2D002, as follows:

(a) “Software” specially designed or modified for the “development” or “production” of equipment specified in 2A001 or 2B001 to 2B009; (L.N. 85 of 2023)

(b) “Software” specially designed or modified for the “use” of equipment specified in 2A001(c), 2B001 or 2B003 to 2B009;

Note:

2D001 does not control part programming “software” that generates “numerical control” codes for machining various parts.

(L.N. 42 of 2017)

2D002 “Software” for electronic devices, even when residing in an electronic device or system, enabling such devices or systems to function as a “numerical control” unit, capable of coordinating simultaneously more than 4 axes for “contouring control”;

Notes: (L.N. 65 of 2004)

1. 2D002 does not control “software” specially designed or modified for the operation of items not specified in Category 2. (L.N. 132 of 2001; L.N. 65 of 2004; L.N. 42 of 2017)

2. 2D002 does not control “software” for items specified in 2B002. See 2D001 and 2D003 for “software” for items specified in 2B002. (L.N. 65 of 2004; L.N. 42 of 2017)

3. 2D002 does not control “software” that is exported with, and the minimum necessary for the operation of, items not specified in Category 2. (L.N. 42 of 2017)

2D003 “Software”, designed or modified for the operation of equipment specified in 2B002, that converts optical designs, workpiece measurements and material removal functions into “numerical control” commands to achieve the desired workpiece form;

(L.N. 42 of 2017)

2D101 “Software” specially designed or modified for the “use” of equipment controlled by 2B104, 2B105, 2B109, 2B116, 2B117 or 2B119 to 2B122; (L.N. 95 of 2006)

N.B.:

See also 9D004.

(L.N. 65 of 2004)

2D201 “Software” specially designed for the “use” of equipment controlled by 2B204, 2B206, 2B207, 2B209, 2B219 or 2B227;

(L.N. 132 of 2001)

2D202 “Software” specially designed or modified for the “development”, “production” or “use” of equipment specified in 2B201;

Note:

2D202 does not control part programming “software” that generates “numerical control” command codes but does not allow direct use of equipment for machining various parts. (L.N. 42 of 2017)

(L.N. 42 of 2017)

2D351 “Software”, other than that specified in 1D003, specially designed for “use” of equipment specified in 2B351;

(L.N. 161 of 2011)

2E Technology

2E001 “Technology” according to the General Technology Note for the “development” of equipment or “software” controlled by 2A, 2B or 2D;

Note:

2E001 includes “technology” for the integration of probe systems into coordinate measurement machines (CMM) specified in 2B006(a). (L.N. 89 of 2013; L.N. 42 of 2017)

2E002 “Technology” according to the General Technology Note for the “production” of equipment controlled by 2A or 2B;

2E003 Other “technology”, as follows:

(a) (Repealed L.N. 89 of 2021)

(b) “Technology” for metal-working manufacturing processes, as follows:

(1) “Technology” for the design of tools, dies or fixtures specially designed for any of the following processes:

(a) “Superplastic forming”;

(b) “Diffusion bonding”; or

Technical Note:

‘Direct-acting hydraulic pressing’ is a deformation process which uses a fluid-filled flexible bladder in direct contact with the workpiece. (L.N. 85 of 2023)

(2) (Repealed L.N. 85 of 2023)

N.B.:

For “technology” for metal-working manufacturing processes for gas turbine engines and components, see 9E003 and ML22. (L.N. 85 of 2023)

(c) “Technology” for the “development” or “production” of hydraulic stretch-forming machines and dies therefor, for the manufacture of airframe structures;

(d) (Repealed L.N. 89 of 2021)

(e) “Technology for the development” of integration “software” for incorporation of expert systems for advanced decision support of shop floor operations into “numerical control” units;

(f) “Technology” for the application of inorganic overlay coatings or inorganic surface modification coatings (specified in column 3 of the following table) to non-electronic substrates (specified in column 2 of the following table), by processes specified in column 1 of the following table and defined in the Technical Note;

N.B.:

This Table should be read to control the “technology” of a particular ‘Coating Process’ only when the Resultant Coating in column 3 is in a paragraph directly across from the relevant ‘Substrate’ under column 2. For example, Chemical Vapour Deposition (CVD) ‘coating process’ technical data are controlled for the application of ‘Silicides’ to ‘Carbon-carbon, Ceramic and Metal “matrix” “composites”’ substrates, but are not controlled for the application of ‘Silicides’ to ‘Cemented tungsten carbide⁽¹⁶⁾, Silicon carbide⁽¹⁸⁾’ substrates. In the second case, the resultant coating is not listed in the paragraph under column 3 directly across from the paragraph under column 2 listing ‘Cemented tungsten carbide⁽¹⁶⁾, Silicon carbide⁽¹⁸⁾’. (L.N. 132 of 2001; L.N. 85 of 2023)

2E101 “Technology” according to the General Technology Note for the “use” of equipment or “software” controlled by 2B004, 2B009, 2B104, 2B109, 2B116, 2B119 to 2B122 or 2D101;

(L.N. 85 of 2023)

2E201 “Technology” according to the General Technology Note for the “use” of equipment or “software” specified in 2A225, 2A226, 2B001, 2B006, 2B007(b), 2B007(c), 2B008, 2B009, 2B201, 2B204, 2B206, 2B207, 2B209, 2B225 to 2B233, 2D201 or 2D202;

(L.N. 85 of 2023)

2E301 “Technology” according to the General Technology Note for the “use” of goods controlled by 2B350 to 2B352;

(L.N. 85 of 2023)

TABLE—DEPOSITION TECHNIQUES

1. Coating Process⁽¹⁾*		2. Substrate	3. Resultant Coating
A.	Chemical Vapour Deposition (CVD)	“Superalloys”	Aluminides for internal passages
	Chemical Vapour Deposition (CVD)	Ceramics⁽¹⁹⁾ and Low-expansion glasses⁽¹⁴⁾	Silicides Carbides Dielectric layers⁽¹⁵⁾ Diamond Diamond-like carbon⁽¹⁷⁾
		Carbon-carbon, Ceramic and Metal “matrix” “composites”	Silicides Carbides Refractory metals Mixtures thereof⁽⁴⁾ Dielectric layers⁽¹⁵⁾ Aluminides Alloyed aluminides⁽²⁾ Boron nitride
		Cemented tungsten carbide⁽¹⁶⁾, Silicon carbide⁽¹⁸⁾	Carbides Tungsten Mixtures thereof⁽⁴⁾ Dielectric layers⁽¹⁵⁾
		Molybdenum and Molybdenum alloys	Dielectric layers⁽¹⁵⁾
		Beryllium and Beryllium alloys	Dielectric layers⁽¹⁵⁾ Diamond Diamond-like carbon⁽¹⁷⁾
		Sensor window materials⁽⁹⁾	Dielectric layers⁽¹⁵⁾ Diamond Diamond-like carbon⁽¹⁷⁾

B.	Thermal Evaporation- Physical Vapour Deposition (TE-PVD)
	1. Physical Vapour Deposition (PVD): Electron Beam (EB-PVD)	“Superalloys”	Alloyed silicides Alloyed aluminides⁽²⁾ MCrA1X⁽⁵⁾ Modified zirconia⁽¹²⁾ Silicides Aluminides Mixtures thereof⁽⁴⁾
		Ceramics⁽¹⁹⁾ and Low- expansion glasses⁽¹⁴⁾	Dielectric layers⁽¹⁵⁾
		Corrosion resistant steel⁽⁷⁾	MCrAlX⁽⁵⁾ Modified zirconia⁽¹²⁾ Mixtures thereof⁽⁴⁾
		Carbon-carbon, Ceramic and Metal “matrix” “composites”	Silicides Carbides Refractory metals Mixtures thereof⁽⁴⁾ Dielectric layers⁽¹⁵⁾ Boron nitride
		Cemented tungsten carbide⁽¹⁶⁾, Silicon carbide⁽¹⁸⁾	Carbides Tungsten Mixtures thereof⁽⁴⁾ Dielectric layers⁽¹⁵⁾
		Molybdenum and Molybdenum alloys	Dielectric layers⁽¹⁵⁾
		Beryllium and Beryllium alloys	Dielectric layers⁽¹⁵⁾ Borides Beryllium
		Sensor window materials⁽⁹⁾	Dielectric layers⁽¹⁵⁾
		Titanium alloys⁽¹³⁾	Borides Nitrides

	2. Physical Vapour Deposition (PVD): Ion Assisted Resistive Heating (Ion Plating)	Ceramics⁽¹⁹⁾ and Low-expansion glasses⁽¹⁴⁾	Dielectric layers⁽¹⁵⁾ Diamond-like carbon⁽¹⁷⁾
		Carbon-carbon, Ceramic and Metal “matrix” “composites”	Dielectric layers⁽¹⁵⁾
		Cemented tungsten carbide⁽¹⁶⁾, Silicon carbide⁽¹⁸⁾	Dielectric layers⁽¹⁵⁾
		Molybdenum and Molybdenum alloys	Dielectric layers⁽¹⁵⁾
		Beryllium and Beryllium alloys	Dielectric layers⁽¹⁵⁾
		Sensor window materials⁽⁹⁾	Dielectric layers⁽¹⁵⁾ Diamond-like carbon⁽¹⁷⁾

	3. Physical Vapour Deposition (PVD): “Laser” Vaporization	Ceramics⁽¹⁹⁾ and Low-expansion glasses⁽¹⁴⁾	Silicides Dielectric layers⁽¹⁵⁾ Diamond-like carbon⁽¹⁷⁾
	3. Physical Vapour Deposition (PVD): “Laser” Vaporization	Carbon-carbon, Ceramic and Metal “matrix” “composites”	Dielectric layers⁽¹⁵⁾
		Cemented tungsten carbide⁽¹⁶⁾, Silicon carbide⁽¹⁸⁾	Dielectric layers⁽¹⁵⁾
		Molybdenum and Molybdenum alloys	Dielectric layers⁽¹⁵⁾
		Beryllium and Beryllium alloys	Dielectric layers⁽¹⁵⁾
		Sensor window materials⁽⁹⁾	Dielectric layers⁽¹⁵⁾ Diamond-like carbon⁽¹⁷⁾

	4. Physical Vapour deposion (PVD): Cathodic Arc Discharge	“Superalloys”	Alloyed silicides Alloyed aluminides⁽²⁾ MCrA1X⁽⁵⁾
	4. Physical Vapour deposion (PVD): Cathodic Arc Discharge	Polymers⁽¹¹⁾ and Organic “matrix” “composites”	Borides Carbides Nitrides Diamond-like carbon⁽¹⁷⁾

C.	Pack Cementation (see A above for out-of-pack cementation)⁽¹⁰⁾	Carbon-carbon, Ceramic and Metal “matrix” “composites”	Silicides Carbides Mixtures thereof⁽⁴⁾
		Titanium alloys⁽¹³⁾	Silicides Aluminides Alloyed aluminides⁽²⁾
		Refractory metals and alloys⁽⁸⁾	Silicides Oxides

D.	Plasma Spraying	“Superalloys”	MCrA1X⁽⁵⁾ Modified zirconia⁽¹²⁾ Mixtures thereof⁽⁴⁾ Abradable Nickel- Graphite Abradable materials containing Ni-Cr-Al Abradable A1-Si- Polyester Alloyed aluminides⁽²⁾
		Aluminium alloys⁽⁶⁾	MCrA1X⁽⁵⁾ Modified zirconia⁽¹²⁾ Silicides Mixtures thereof⁽⁴⁾
		Refractory metals and alloys⁽⁸⁾	Aluminides Silicides Carbides
		Corrosion resistant steel⁽⁷⁾	MCrAlX⁽⁵⁾ Modified zirconia⁽¹²⁾ Mixtures thereof⁽⁴⁾
		Titanium alloys⁽¹³⁾	Carbides Aluminides Silicides Alloyed aluminides⁽²⁾ Abradable Nickel- Graphite Abradable materials containing Ni-Cr-Al Abradable A1-Si- Polyester

E.	Slurry Deposition	Refractory metals and alloys⁽⁸⁾	Fused silicides Fused aluminides except for resistance heating elements
		Carbon-carbon, Ceramic and Metal “matrix” “composites”	Silicides Carbides Mixtures thereof⁽⁴⁾

F.	Sputter Deposition	“Superalloys”	Alloyed silicides Alloyed aluminides⁽²⁾ Noble metal modified aluminides⁽³⁾ MCrA1X⁽⁵⁾ Modified zirconia⁽¹²⁾ Platinum Mixtures thereof⁽⁴⁾
		Ceramics⁽¹⁹⁾ and Low-expansion glasses⁽¹⁴⁾	Silicides Platinum Mixtures thereof⁽⁴⁾ Dielectric layers⁽¹⁵⁾ Diamond-like carbon⁽¹⁷⁾
		Titanium alloys⁽¹³⁾	Borides Nitrides Oxides Silicides Aluminides Alloyed aluminides⁽²⁾ Carbides
		Carbon-carbon, Ceramic and Metal “matrix” “composites”	Silicides Carbides Refractory metals Mixtures thereof⁽⁴⁾ Dielectric layers⁽¹⁵⁾ Boron nitride
		Cemented tungsten carbide⁽¹⁶⁾, Silicon carbide⁽¹⁸⁾	Carbides Tungsten Mixtures thereof⁽⁴⁾ Dielectric layers⁽¹⁵⁾ Boron nitride
		Molybdenum and Molybdenum alloys	Dielectric layers⁽¹⁵⁾
		Beryllium and Beryllium alloys	Borides Dielectric layers⁽¹⁵⁾ Beryllium
		Sensor window materials⁽⁹⁾	Dielectric layers⁽¹⁵⁾ Diamond-like carbon⁽¹⁷⁾
		Refractory metals and alloys⁽⁸⁾	Aluminides Silicides Oxides Carbides

G.	Ion Implantation	High temperature bearing steels	Additions of Chromium, Tantalum or Niobium (Columbium)
		Titanium alloys⁽¹³⁾	Borides Nitrides
		Beryllium and Beryllium alloys	Borides
		Cemented tungsten carbide⁽¹⁶⁾	Carbides Nitrides
(L.N. 132 of 2001)

* The numbers in parenthesis refer to the Notes following this Table.

TABLE—DEPOSITION TECHNIQUES—NOTES

1. The term ‘coating process’ includes coating repair and refurbishing as well as original coating.

2. The term ‘alloyed aluminide coating’ includes single or multiple-step coatings in which an element or elements are deposited prior to or during application of the aluminide coating, even if these elements are deposited by another coating process. It does not, however, include the multiple use of single-step pack cementation processes to achieve alloyed aluminides. (L.N. 85 of 2023)

3. The term ‘noble metal modified aluminide’ coating includes multiple-step coatings in which the noble metal or noble metals are laid down by some other coating process prior to application of the aluminide coating.

4. The term ‘mixtures thereof’ includes infiltrated material, graded compositions, co-deposits and multilayer deposits and are obtained by one or more of the coating processes specified in the Table.

5. ‘MCrA1X’ refers to a coating alloy where M equals cobalt, iron, nickel or combinations thereof and X equals hafnium, yttrium, silicon, tantalum in any amount or other intentional additions over 0.01 weight percent in various proportions and combinations, except:

(a) CoCrA1Y coatings which contain less than 22 weight percent of chromium, less than 7 weight percent of aluminium and less than 2 weight percent of yttrium;

(b) CoCrA1Y coatings which contain 22 to 24 weight percent of chromium, 10 to 12 weight percent of aluminium and 0.5 to 0.7 weight percent of yttrium; or

(c) NiCrA1Y coatings which contain 21 to 23 weight percent of chromium, 10 to 12 weight percent of aluminium and 0.9 to 1.1 weight percent of yttrium.

6. The term ‘aluminium alloys’ refers to alloys having an ultimate tensile strength of 190 MPa or more measured at 293 K (20°C).

7. The term ‘corrosion resistant steel’ refers to AISI (American Iron and Steel Institute) 300 series or equivalent national standard steels.

8. ‘Refractory metals and alloys’ include the following metals and their alloys: niobium (columbium), molybdenum, tungsten and tantalum.

9. ‘Sensor window materials’, as follows: alumina, silicon, germanium, zinc sulphide, zinc selenide, gallium arsenide, diamond, gallium phosphide, sapphire and the following metal halides: sensor window materials of more than 40 mm diameter for zirconium fluoride and hafnium fluoride.

10. “Technology” for single-step pack cementation of solid aerofoils is not controlled by Category 2. (L.N. 85 of 2023)

11. ‘Polymers’, as follows: polyimide, polyester, polysulphide, polycarbonates and polyurethanes.

12. ‘Modified zirconia’ refers to additions of other metal oxides (e.g. calcia, magnesia, yttria, hafnia, rare earth oxides) to zirconia in order to stabilise certain crystallographic phases and phase compositions. Thermal barrier coatings made of zirconia, modified with calcia or magnesia by mixing or fusion, are not controlled.

13. ‘Titanium alloys’ refers to aerospace alloys having an ultimate tensile strength of 900 MPa or more measured at 293 K (20°C).

14. ‘Low-expansion glasses’ refers to glasses which have a coefficient of thermal expansion of 1 × 10^-7 K^-1 or less measured at 293 K (20°C).

15. ‘Dielectric layers’ are coatings constructed of multi-layers of insulator materials in which the interference properties of a design composed of materials of various refractive indices are used to reflect, transmit or absorb various wavelength bands. Dielectric layers refers to more than four dielectric layers or dielectric/metal “composite” layers.

16. ‘Cemented tungsten carbide’ does not include cutting and forming tool materials consisting of tungsten carbide/(cobalt, nickel), titanium carbide/(cobalt, nickel), chromium carbide/nickel-chromium and chromium carbide/nickel.

17. “Technology” for depositing diamond-like carbon on any of the following is not included: (L.N. 85 of 2023)

magnetic disk drives and heads, equipment for the manufacture of disposables, valves for faucets, acoustic diaphragms for speakers, engine parts for automobiles, cutting tools, punching-pressing dies, office automation equipment, microphones or medical devices; or moulds for casting or moulding of plastics, manufactured from alloys containing less than 5% beryllium. (L.N. 65 of 2004)

18. ‘Silicon carbide’ does not include cutting and forming tool materials.

19. Ceramic substrates, as used in this entry, does not include ceramic materials containing 5% by weight, or greater, clay or cement content, either as separate constituents or in combination.

(L.N. 132 of 2001)

TABLE—DEPOSITION TECHNIQUES—TECHNICAL NOTE

Processes specified in column 1 of the Table are defined as follows:

(a) Chemical Vapour Deposition (CVD) is an overlay coating or surface modification coating process wherein a metal, alloy, “composite”, dielectric or ceramic is deposited upon a heated substrate. Gaseous reactants are decomposed or combined in the vicinity of a substrate resulting in the deposition of the desired elemental, alloy or compound material on the substrate. Energy for this decomposition or chemical reaction process may be provided by the heat of the substrate, a glow discharge plasma, or “laser” irradiation.

N.B.:

1. CVD includes the following processes: directed gas flow out-of-pack deposition, pulsating CVD, controlled nucleation thermal deposition (CNTD), plasma enhanced or plasma assisted CVD processes.

2. Pack denotes a substrate immersed in a powder mixture.

3. The gaseous reactants used in the out-of-pack process are produced using the same basic reactions and parameters as the pack cementation process, except that the substrate to be coated is not in contact with the powder mixture.

(b) Thermal Evaporation-Physical Vapour Deposition (TE-PVD) is an overlay coating process conducted in a vacuum with a pressure less than 0.1 Pa wherein a source of thermal energy is used to vaporize the coating material. This process results in the condensation, or deposition, of the evaporated species onto appropriately positioned substrates.

The addition of gases to the vacuum chamber during the coating process to synthesize compound coatings is an ordinary modification of the process.

The use of ion or electron beams, or plasma, to activate or assist the coating’s deposition is also a common modification in this technique. The use of monitors to provide in-process measurement of optical characteristics and thickness of coatings can be a feature of these processes.

Specific TE-PVD processes are as follows:

(1) Electron Beam PVD uses an electron beam to heat and evaporate the material which forms the coating;

(2) Ion Assisted Resistive Heating PVD employs electrically resistive heating sources in combination with impinging ion beam(s) to produce a controlled and uniform flux of evaporated coating species;

(3) “Laser” Vaporization uses either pulsed or continuous wave “laser” beams to vaporize the material which forms the coating;

(4) Cathodic Arc Deposition employs a consumable cathode of the material which forms the coating and has an arc discharge established on the surface by a momentary contact of a ground trigger. Controlled motion of arcing erodes the cathode surface creating a highly ionized plasma. The anode can be either a cone attached to the periphery of the cathode, through an insulator, or the chamber. Substrate biasing is used for non line-of-sight deposition;

N.B.:

This definition does not include random cathodic arc deposition with non-biased substrates.

(5) Ion Plating is a special modification of a general TE-PVD process in which a plasma or an ion source is used to ionize the species to be deposited, and a negative bias is applied to the substrate in order to facilitate the extraction of the species from the plasma. The introduction of reactive species, evaporation of solids within the process chamber, and the use of monitors to provide in-process measurement of optical characteristics and thicknesses of coatings are ordinary modifications of the process.

(c) Pack Cementation is a surface modification coating or overlay coating process wherein a substrate is immersed in a powder mixture (a pack), that consists of:

(1) The metallic powders that are to be deposited (usually aluminium, chromium, silicon or combinations thereof);

(2) An activator (normally a halide salt); and

(3) An inert powder, most frequently alumina.

The substrate and powder mixture is contained within a retort which is heated to between 1 030 K (757°C) and 1 375 K (1 102°C) for sufficient time to deposit the coating.

(d) Plasma Spraying is an overlay coating process wherein a gun (spray torch) which produces and controls a plasma accepts powder or wire coating materials, melts them and propels them towards a substrate, whereon an integrally bonded coating is formed. Plasma spraying constitutes either low pressure plasma spraying or high velocity plasma spraying.

N.B.:

1. Low pressure means less than ambient atmospheric pressure.

2. High velocity refers to nozzle-exit gas velocity exceeding 750 m/s calculated at 293 K (20°C) at 0.1 MPa.

(e) Slurry Deposition is a surface modification coating or overlay coating process wherein a metallic or ceramic powder with an organic binder is suspended in a liquid and is applied to a substrate by either spraying, dipping or painting, subsequent air or oven drying, and heat treatment to obtain the desired coating.

(f) Sputter Deposition is an overlay coating process based on a momentum transfer phenomenon, wherein positive ions are accelerated by an electric field towards the surface of a target (coating material). The kinetic energy of the impacting ions is sufficient to cause target surface atoms to be released and deposited on an appropriately positioned substrate.

N.B.:

1. The Table refers only to triode, magnetron or reactive sputter deposition which is used to increase adhesion of the coating and rate of deposition and to radio frequency (RF) augmented sputter deposition used to permit vaporization of non-metallic coating materials.

2. Low-energy ion beams (less than 5 keV) can be used to activate the deposition.

(g) Ion implantation is a surface modification coating process in which the element to be alloyed is ionized, accelerated through a potential gradient and implanted into the surface region of the substrate. This includes processes in which ion implantation is performed simultaneously with electron beam physical vapour deposition or sputter deposition.

(L.N. 132 of 2001)

TABLE—DEPOSITION TECHNIQUES—STATEMENT OF UNDERSTANDING

It is understood that the following technical information, accompanying the table of deposition techniques, is for use as appropriate.

1. Technical information for pretreatments of the substrates listed in the Table, as follows: (L.N. 85 of 2023)

(a) Chemical stripping and cleaning bath cycle parameters, as follows:

(1) Bath composition:

(a) For the removal of old or defective coatings, corrosion product or foreign deposits;

(b) For preparation of virgin substrates;

(2) Time in bath;

(3) Temperature of bath;

(4) Number and sequences of wash cycles;

(b) Visual and macroscopic criteria for acceptance of the cleaned part;

(1) Atmosphere parameters, as follows:

(a) Composition of the atmosphere;

(b) Pressure of the atmosphere;

(2) Temperature for heat treatment;

(3) Time of heat treatment;

(d) Substrate surface preparation parameters, as follows:

(1) Grit blasting parameters, as follows:

(a) Grit composition;

(b) Grit size and shape;

(2) Time and sequence of cleaning cycle after grit blast;

(3) Surface finish parameters;

(4) Application of binders to promote adhesion; (L.N. 89 of 2021)

(e) Masking technique parameters, as follows:

(1) Material of mask;

(2) Location of mask.

2. Technical information for in situ quality assurance techniques for evaluation of the coating processes listed in the Table, as follows: (L.N. 85 of 2023)

(a) Atmosphere parameters, as follows:

(1) Composition of the atmosphere;

(2) Pressure of the atmosphere;

(b) Time parameters;

(d) Thickness parameters;

(e) Index of refraction parameters;

(f) Control of composition.

3. Technical information for post deposition treatments of the coated substrates listed in the Table, as follows: (L.N. 85 of 2023)

(a) Shot peening parameters, as follows:

(1) Shot composition;

(2) Shot size;

(3) Shot velocity;

(b) Post shot peening cleaning parameters;

(1) Atmosphere parameters, as follows:

(a) Composition of the atmosphere;

(b) Pressure of the atmosphere;

(2) Time-temperature cycles;

(d) Post heat treatment visual and macroscopic criteria for acceptance of the coated substrates.

4. Technical information for quality assurance techniques for the evaluation of the coated substrates listed in the Table, as follows: (L.N. 85 of 2023)

(a) Statistical sampling criteria;

(b) Microscopic criteria for:

(1) Magnification;

(2) Coating thickness uniformity;

(3) Coating integrity;

(4) Coating composition;

(5) Coating and substrates bonding;

(6) Microstructural uniformity;

(1) Reflectance;

(2) Transmission;

(3) Absorption;

(4) Scatter.

5. Technical information and parameters related to specific coating and surface modification processes listed in the Table, as follows: (L.N. 85 of 2023)

(a) For Chemical Vapour Deposition:

(1) Coating source composition and formulation;

(2) Carrier gas composition;

(3) Substrate temperature;

(4) Time-temperature-pressure cycles;

(5) Gas control and part manipulation;

(b) For Thermal Evaporation-Physical Vapour Deposition:

(1) Ingot or coating material source composition;

(2) Substrate temperature;

(3) Reactive gas composition;

(4) Ingot feed rate or material vaporisation rate;

(5) Time-temperature-pressure cycles;

(6) Beam and part manipulation;

(7) “Laser” parameters, as follows:

(a) Wavelength; (L.N. 85 of 2023)

(b) Power density;

(d) Repetition ratio;

(e) Source;

(f) (Repealed L.N. 89 of 2021)

(1) Pack composition and formulation;

(2) Carrier gas composition;

(3) Time-temperature-pressure cycles;

(d) For Plasma Spraying:

(1) Powder composition, preparation and size distributions;

(2) Feed gas composition and parameters;

(3) Substrate temperature;

(4) Gun power parameters;

(5) Spray distance;

(6) Spray angle;

(7) Cover gas composition, pressure and flow rates;

(8) Gun control and part manipulation;

(e) For Sputter Deposition:

(1) Target composition and fabrication;

(2) Geometrical positioning of part and target;

(3) Reactive gas composition;

(4) Electrical bias;

(5) Time-temperature-pressure cycles;

(6) Triode power;

(7) Part manipulation;

(f) For Ion Implantation: (L.N. 65 of 2004)

(1) Beam control and part manipulation;

(2) Ion source design details;

(3) Control techniques for ion beam and deposition rate parameters;

(4) Time-temperature-pressure cycles;

(g) For Ion Plating:

(1) Beam control and part manipulation;

(2) Ion source design details;

(3) Control techniques for ion beam and deposition rate parameters;

(4) Time-temperature-pressure cycles;

(5) Coating material feed rate and vaporisation rate;

(6) Substrate temperature;

(7) Substrate bias parameters.

(L.N. 183 of 1999)

(L.N. 85 of 2023)

Last Revision Date : 20 December 2023